• TMAXCN Brand in Stock 99.99 % High Purity Copper Cu Sputtering Target
  • TMAXCN Brand in Stock 99.99 % High Purity Copper Cu Sputtering Target

TMAXCN Brand in Stock 99.99 % High Purity Copper Cu Sputtering Target

Customized: Customized
Material: Aluminum
Transport Package: Packed in Cartons or Wooden Cases
Specification: 04-30mm*200mm*300mm
Trademark: TMAX
Customization:
Diamond Member Since 2020

Suppliers with verified business licenses

Manufacturer/Factory

Basic Info.

Model NO.
TMAX-Cu target
Production Capacity
10000PCS/Month

Product Description

 

TMAXCN Brand in Stock 99.99 % High Purity Copper Cu Sputtering Target
In Stock 99.99 % High Purity Copper Cu Sputtering Target

Introduction

Copper Backing Plate is used for improving the conductivity of the nonmetallic plasma sputtering targets. 

Chemical Symbol Copper
Thickness 2.3 mm OR customized size
Weight 1 oz   or    2  oz
Color Reddish Brown
Application Notes

Used for bonding with nonmetallic sputtering targets.

 

TMAXCN Brand in Stock 99.99 % High Purity Copper Cu Sputtering TargetTMAXCN Brand in Stock 99.99 % High Purity Copper Cu Sputtering Target

TMAXCN Brand in Stock 99.99 % High Purity Copper Cu Sputtering Target



TMAXCN Brand in Stock 99.99 % High Purity Copper Cu Sputtering TargetTMAXCN Brand in Stock 99.99 % High Purity Copper Cu Sputtering TargetTMAXCN Brand in Stock 99.99 % High Purity Copper Cu Sputtering TargetTMAXCN Brand in Stock 99.99 % High Purity Copper Cu Sputtering TargetTMAXCN Brand in Stock 99.99 % High Purity Copper Cu Sputtering Target

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Diamond Member Since 2020

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Manufacturer/Factory
Plant Area
>2000 square meters
Management System Certification
ISO 9001