Perovskite Solar Cell Small Drawer Type Perovskite UV Light Cleaning Machine for Small Substrate Cleaning Such as ITO And FTO

• Condition: New
• Automation: Automation
• Warranty: 1 Year
• Automatic Production Line: Comprehensive
• Certification: CE, ISO
• Rhythm: Flow Production Line
• Model NO.: TMAX-BZS
• Transport Package: Wood Packing
• Specification: 20-100 foot cabinet
• Trademark: TMAX
• Origin: China

Product Description

Perovskite Solar Cell Small Drawer Type Perovskite UV Light Cleaning Machine for Small Substrate Cleaning Such as ITO And FTO

 

 

UV light cleaning machine BZS250GF-TC has industrial level cleaning efficiency and effect, suitable for small substrate cleaning, such as liquid crystal panel, ITO, FTO, optical glass, OLED, LCD, silicon, ceramic, metal sheet, polymer, silicone and other surface cleaning, for cleaning the surface organic matter of the product, that is, surface modification. Thus better hydrophilicity is obtained.

 

A. Product configuration

Serial number	Description	Model number
		BZS200GF-TC	BZS250GF-TC	BZS320GF-TC
1	Material of complete machine	The whole machine is made of mirror stainless steel 304, and the key components are made of Schneider, Omron and other brands
2	Power supply	220V,250W	220V,300W	220V,350W
3	Lamp power	200W	250W	320W
4	Cleaning size	150*150mm	200*200mm	250*250mm
5	Lamp material technology	Japanese pure quartz material, one shape grille lamp
6	Operating spectrum	185+254nm
7	Lamp life	8000 hours
8	Time frame	0-99 minutes/hour
9	Irradiation height	0-100mm
10	Light assist	High performance reflector
11	Heating (optional)	Heating range from room temperature to 300ºC
12	Safety protection	The lamp goes out automatically when the drawer is pulled out
13	Cue light	Exception indication/alert
14	Exhaust function	With ozone exhaust system, 125mm diameter outlet, equipped with air pipes and fasteners
15	Overall dimension	350W*400L*350H (mm)		450L*390W*350H (mm)
16	Weight	20kg		22kg

 

 

B. Application field

Clean the substrate prior to film deposition. Scum removal and stabilization of photoresist treatment. Ultra-high vacuum seal.

Clean silicon chips, lenses, mirrors, solar panels, cold rolled steel, inertial guidance parts and GaAs chips

Clean flux, mixing circuit and flat panel LCD display

Etch Teflon, fluororubbers and other organic materials

Enhanced GaAs and Si oxide passivation surface

Enhance the degassing effect of glass

Substrate blue film removal

Enhance the adhesion of the coating on the plastic surface

Clear ink stain after final test of substrate

Remove photoresist

Flat panel display/LCD display

Remove residuals from the lithographic machine

Clean the circuit board before packaging and taping)

Optical fiber

Enhanced surface hydrophilic properties

Cleaning and disinfection for bioscience applications

Optical lens

Other applications

 

C. Cleaning effect

The cleaning effect is generally tested by the substrate surface hydrophilicity, that is, the contact Angle